Hafnium propoxide is an organic metal compound of hafnium, mainly used as a precursor for high dielectric constant materials in metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD). Due to its stable physical properties, it is commonly used in the production of thin film materials and coatings.
Semiconductor: Used to prepare high dielectric constant materials in integrated circuits to enhance capacitance characteristics.
Optical thin film: can be used as a thin film coating in optical devices.
New energy materials: raw materials used as high-purity materials in the fields of new energy and high-tech materials.
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