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Hafnium butoxide
Molecular formula: Hf(OC₄H₉)₄
Purity: ≥70%
CAS NO: 22411-22-9
Molecular weight: 470.95
Appearance and shape: Colorless to slightly yellow liquid
Density: 0.87g/cm³
Melting point:
Boiling point: 280℃
Scale: 25kg/barrel, capable of ton level supply
Abbreviation: HTB
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Hafnium butoxide
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A hafnium organic metal compound with good volatility and chemical stability, widely used in the deposition of high-tech thin film materials. Its excellent thermal decomposition properties make it an important precursor material in the semiconductor industry.

Electronic manufacturing: used as a precursor for dielectric materials in the semiconductor industry.
Thin film preparation: used for manufacturing thin films in the optical, electronic, and new energy industries.
Catalyst: Can be used as a catalyst in specific organic synthesis reactions.
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